Specially launched acid and alkali resistant, solvent resistant ultrafiltration membrane/nanofiltration membrane components:

Acid resistant membrane components are developed for applications in acidic environments, which can maintain high flux and stable operation for a long time under high pressure and high temperature conditions. They also have the characteristics of high pressure resistance (40-60 bar) and high temperature resistance (≤ 80 ℃). This series of membrane components is applied for the purification of low pH acid solutions and concentration of target substances. Typical applications of feed solutions are as follows:

20%H2SO4    20%H3PO4     15%HCl      4%HNO


Alkali resistant membrane components are developed for applications in alkaline environments, which can maintain high flux and stable operation for a long time under high pressure and high temperature conditions. They also have the characteristics of high pressure resistance (40-60 bar) and high temperature resistance (≤ 60 ℃). This series is applied for the purification of high pH alkaline solutions and the concentration of target substances. Typical feed liquid applications are as follows:

4%NaOH    10%NaOH    20%NaOH    10%KOH


Solvent resistant membrane components are developed for applications in organic solvent environments, which can maintain high flux and stable operation for a long time under high pressure and high temperature conditions. They also have the characteristics of high pressure resistance (40-60 bar) and high temperature resistance (≤ 60 ℃). This series is applied for the purification of organic solvents and concentration of target substances. Typical liquid applications are as follows:

Methanol, ethanol, propanol, acetone, acetonitrile, hexane, ethyl acetate, tetrahydrofuran, THF, dimethylformamide, DMF